Preparation of highly dispersed tungsten oxide on MCM-41 via atomic layer deposition and its application to butanol dehydration

Hyeonjoo Kim, Soyeon Jeong, Do Heui Kim, Young Kwon Park, Jong Ki Jeon

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Highly dispersed tungsten oxide on MCM-41 was synthesized using a novel atomic layer deposition (ALD) method. BET, XRD, XPS, NH -TPD, and pyridine-IR were used to study the physicochemical properties of the supported tungsten oxides. In this study, the maximum loading of tungsten oxide on MCM-41 that could be prepared using the modi?ed ALD method was 27.0 wt%. It was con?rmed that the textural properties of the mesoporous silica were maintained after tungsten oxide loading. The NH 3 3 -TPD and Py-IR results indicated that weak acid sites, mainly Lewis acid sites, were produced over the WO /MCM-41 samples. Moreover, 2-butanol dehydration was performed to demonstrate the potential advantages of the WO 3 3 /MCM-41 catalysts. The WO /MCM-41 catalyst with 27.0 wt% tungsten oxide loading showed the highest activity in the dehydration of 2-butanol, which was attributed to the highest overall number of acid sites among the WO /MCM-41 catalysts. The highly dispersed tungsten oxide on MCM-41 prepared via ALD can be an effective catalyst for producing butenes through 2-butanol dehydration.

Original languageEnglish
Pages (from-to)6074-6079
Number of pages6
JournalJournal of Nanoscience and Nanotechnology
Volume12
Issue number7
DOIs
StatePublished - Jul 2012

Keywords

  • Atomic Layer Deposition
  • Butanol Dehydration
  • MCM-41
  • Tungsten Oxide

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