Properties of a counter electrode with nickel silicides in a dye sensitized solar cell

Kwangbae Kim, Yunyoung Noh, Minkyoung Choi, Ohsung Song

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4 Scopus citations


Nickel silicide was used as a counter electrode to replace the Pt catalytic layer of a dye-sensitized solar cell (DSSC) device. 50 nm Si/50 nm Ni was formed on glass or quartz by sputtering, and nickel silicides were formed by vacuum heat treatments at 450 and 800 °C for 30 min. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) depth profiling analysis was used to confirm the formation of nickel silicides. Also, cyclic voltammetry (CV) analysis was employed to confirm the catalytic activity, and photovoltaic properties were confirmed using a simulator and potentiostat. The XRD and AES results reveated that NiSi and NiSi2 were formed by annealing at 450 and 800 °C, respectively. The results of the CV analysis showed that both NiSi and NiSi2 exhibited catalytic activity. The energy conversion efficiencies (ECE) of DSSCs with NiSi and NiSi2 catalysts were 1.31% and 3.86%, respectively, while the device employing the Pt catalyst showed an ECE of 5.49%. This result implies that NiSi2 can replace Pt when the processing condition is optimized.

Original languageEnglish
Pages (from-to)615-620
Number of pages6
JournalJournal of Korean Institute of Metals and Materials
Issue number8
StatePublished - Aug 2016


  • Annealing
  • Catalytic activity
  • Phase transformation
  • Solar cells
  • X-ray diffraction


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