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Properties of ZnO/TiO
2
bilayer thin films with a low temperature ALD process
Yunyoung Noh
, Jeungjo Han
, Byungkwan Yu
,
Ohsung Song
Department of Materials Science and Engineering
University of Seoul
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peer-review
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2
bilayer thin films with a low temperature ALD process'. Together they form a unique fingerprint.
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Material Science
Amorphous Material
33%
Auger Electron Spectroscopy
33%
Electrode
16%
Field Emission Scanning Electron Microscopy
33%
Microstructure
33%
Optical Property
33%
Oxidant
16%
Silicon
16%
Temperature
100%
Thin Films
100%
Titanium
16%
Titanium Dioxide
100%
Titanium Oxide
16%
ZnO
100%
Engineering
Deposition Process
100%
Low-Temperature
100%
Microstructure
100%
Substrate Temperature
50%
Thin Films
100%
Titania
50%
Wavelength
50%
Immunology and Microbiology
Absorption
66%
Auger Electron Spectroscopy
66%
Field Emission Scanning Electron Microscopy
66%
Near Infrared Spectroscopy
33%
Optics
100%
Precursor
33%
Temperature
100%
Medicine and Dentistry
Diethylzinc
50%
near Infrared Spectroscopy
50%
Oxidizing Agent
50%
Precursor
50%
Titanium
50%