Quantitative analysis of molecularly stacked layer structures in supported organic thin films by synchrotron grazing-incidence X-ray scattering

Jinhwan Yoon; Seungchel Choi; Sangwoo Jin; Kyeong Sik Jin; Kyuyoung Heo; Moonhor Ree

doi:10.1107/S0021889806056056

Quantitative analysis of molecularly stacked layer structures in supported organic thin films by synchrotron grazing-incidence X-ray scattering

Jinhwan Yoon, Seungchel Choi, Sangwoo Jin, Kyeong Sik Jin, Kyuyoung Heo, Moonhor Ree

Department of Chemical Engineering

Pohang University of Science and Technology

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

In this study, we derive a grazing-incidence X-ray scattering (GIXS) formula to analyze quantitatively GIXS patterns for molecularly stacked layer structures in substrate-supported nanoscale thin films. We apply this formula in the quantitative analysis of GIXS patterns obtained for S-docosanylcysteine thin films on silicon substrates with native oxide layers. This analysis successfully provides information on the structural parameters and orientation of the molecular layer stack developed in S-docosanylcysteine thin films.

Original language	English
Pages (from-to)	s669-s674
Journal	Journal of Applied Crystallography
Volume	40
Issue number	SUPPL. 1
DOIs	https://doi.org/10.1107/S0021889806056056
State	Published - Apr 2007

Keywords

Grazing-incidence X-ray scattering
Molecularly stacked layer structure
Orientation and distribution

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@article{cdb4b2925522406fa63dc2d97f3f48ff,

title = "Quantitative analysis of molecularly stacked layer structures in supported organic thin films by synchrotron grazing-incidence X-ray scattering",

abstract = "In this study, we derive a grazing-incidence X-ray scattering (GIXS) formula to analyze quantitatively GIXS patterns for molecularly stacked layer structures in substrate-supported nanoscale thin films. We apply this formula in the quantitative analysis of GIXS patterns obtained for S-docosanylcysteine thin films on silicon substrates with native oxide layers. This analysis successfully provides information on the structural parameters and orientation of the molecular layer stack developed in S-docosanylcysteine thin films.",

keywords = "Grazing-incidence X-ray scattering, Molecularly stacked layer structure, Orientation and distribution",

author = "Jinhwan Yoon and Seungchel Choi and Sangwoo Jin and Jin, {Kyeong Sik} and Kyuyoung Heo and Moonhor Ree",

year = "2007",

month = apr,

doi = "10.1107/S0021889806056056",

language = "English",

volume = "40",

pages = "s669--s674",

journal = "Journal of Applied Crystallography",

issn = "0021-8898",

publisher = "International Union of Crystallography",

number = "SUPPL. 1",

}

TY - JOUR

T1 - Quantitative analysis of molecularly stacked layer structures in supported organic thin films by synchrotron grazing-incidence X-ray scattering

AU - Yoon, Jinhwan

AU - Choi, Seungchel

AU - Jin, Sangwoo

AU - Jin, Kyeong Sik

AU - Heo, Kyuyoung

AU - Ree, Moonhor

PY - 2007/4

Y1 - 2007/4

N2 - In this study, we derive a grazing-incidence X-ray scattering (GIXS) formula to analyze quantitatively GIXS patterns for molecularly stacked layer structures in substrate-supported nanoscale thin films. We apply this formula in the quantitative analysis of GIXS patterns obtained for S-docosanylcysteine thin films on silicon substrates with native oxide layers. This analysis successfully provides information on the structural parameters and orientation of the molecular layer stack developed in S-docosanylcysteine thin films.

AB - In this study, we derive a grazing-incidence X-ray scattering (GIXS) formula to analyze quantitatively GIXS patterns for molecularly stacked layer structures in substrate-supported nanoscale thin films. We apply this formula in the quantitative analysis of GIXS patterns obtained for S-docosanylcysteine thin films on silicon substrates with native oxide layers. This analysis successfully provides information on the structural parameters and orientation of the molecular layer stack developed in S-docosanylcysteine thin films.

KW - Grazing-incidence X-ray scattering

KW - Molecularly stacked layer structure

KW - Orientation and distribution

UR - http://www.scopus.com/inward/record.url?scp=34248324498&partnerID=8YFLogxK

U2 - 10.1107/S0021889806056056

DO - 10.1107/S0021889806056056

M3 - Article

AN - SCOPUS:34248324498

SN - 0021-8898

VL - 40

SP - s669-s674

JO - Journal of Applied Crystallography

JF - Journal of Applied Crystallography

IS - SUPPL. 1

ER -

Quantitative analysis of molecularly stacked layer structures in supported organic thin films by synchrotron grazing-incidence X-ray scattering

Abstract

Keywords

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