Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

Seolun Yang; H. K. Park; J. S. Kim; S. H. Phark; Young Jun Chang; T. W. Noh; H. N. Hwang; C. C. Hwang; H. D. Kim

doi:10.1016/j.susc.2013.05.012

Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

Seolun Yang, H. K. Park, J. S. Kim, S. H. Phark, Young Jun Chang, T. W. Noh, H. N. Hwang, C. C. Hwang, H. D. Kim

Department of Physics

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations.

Original language	English
Pages (from-to)	12-18
Number of pages	7
Journal	Surface Science
Volume	616
DOIs	https://doi.org/10.1016/j.susc.2013.05.012
State	Published - Oct 2013

Keywords

Ag
Charge transfer energy
Coulomb correlation energy
Image charge potential
Polarization energy
Ultrathin NiO film

Access to Document

10.1016/j.susc.2013.05.012

Cite this

@article{e415e8acaf004e0ba86efd61a8ce9c49,

title = "Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)",

abstract = "As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations.",

keywords = "Ag, Charge transfer energy, Coulomb correlation energy, Image charge potential, Polarization energy, Ultrathin NiO film",

author = "Seolun Yang and Park, {H. K.} and Kim, {J. S.} and Phark, {S. H.} and Chang, {Young Jun} and Noh, {T. W.} and Hwang, {H. N.} and Hwang, {C. C.} and Kim, {H. D.}",

year = "2013",

month = oct,

doi = "10.1016/j.susc.2013.05.012",

language = "English",

volume = "616",

pages = "12--18",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

AU - Yang, Seolun

AU - Park, H. K.

AU - Kim, J. S.

AU - Phark, S. H.

AU - Chang, Young Jun

AU - Noh, T. W.

AU - Hwang, H. N.

AU - Hwang, C. C.

AU - Kim, H. D.

PY - 2013/10

Y1 - 2013/10

N2 - As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations.

AB - As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations.

KW - Ag

KW - Charge transfer energy

KW - Coulomb correlation energy

KW - Image charge potential

KW - Polarization energy

KW - Ultrathin NiO film

UR - http://www.scopus.com/inward/record.url?scp=84880920600&partnerID=8YFLogxK

U2 - 10.1016/j.susc.2013.05.012

DO - 10.1016/j.susc.2013.05.012

M3 - Article

AN - SCOPUS:84880920600

SN - 0039-6028

VL - 616

SP - 12

EP - 18

JO - Surface Science

JF - Surface Science

ER -

Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this