Removal of Cu(II)-ion over amine-functionalized mesoporous silica materials

Hyung Won Lee, Hye Jung Cho, Jin Heong Yim, Ji Man Kim, Jong Ki Jeon, Jung Min Sohn, Kyung Seun Yoo, Seung Soo Kim, Young Kwon Park

Research output: Contribution to journalArticlepeer-review

51 Scopus citations

Abstract

The capability for the adsorption of Cu(II)-ion with mesoporous silica materials, such as MCM-41, SBA-15 and XPD-2412, after functionalizing with amine groups, such as aminopropyltriethoxysilane (APTES), N(β-aminoethyl) γ-aminopropylmethyl dimethoxysilane (AEAPMDMS) and N1-(3-(trimethoxysilyl)-propyl) diethylenetriamine (TMSPDETA), was investigated in this study. N2 adsorption, XRD and elemental analysis methods were performed to gain an understanding of the structure and surface properties of the mesoporous silica materials. Of the absorbent materials, MCM-41, functionalized with APTES, showed the best activity for the adsorption of Cu(II)-ion. Compared with the mesoporous silica materials functionalized with APTES, those functionalized with AEAPMDMS and/or TMSPDETA showed lower adsorption capabilities, which may have been due to the locations of the amine groups. Most of the amine-organic domains were suggested should exist near the opening of channels or external surfaces. Furthermore, the rate of adsorption of Cu(II)-ions matched well with a pseudo-second-order kinetic model.

Original languageEnglish
Pages (from-to)504-509
Number of pages6
JournalJournal of Industrial and Engineering Chemistry
Volume17
Issue number3
DOIs
StatePublished - 25 May 2011

Keywords

  • Amine functionalized
  • Cu(II)-ion
  • Mesoporous silica materials

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