Resonant tunneling through quantum states of enhancement mode an in-plane-gate quantum dot transistor

S. H. Son, S. W. Hwang, J. I. Lee, Y. J. Park, Y. S. Yu, D. Ahn

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrate electron transport in an enhancement mode in-plane-gate quantum dot transistor (IPGQDT). Deeply etched trenches allow large positive biases on the IPG with negligible leakage current. Strong negative differential resistance (NDR) peaks and single electron tunneling are observed in a wide gate bias window. The position of the NDR peaks systematically moves with the change of the gate bias, suggesting that they originate from resonant tunneling through QD quantum states.

Original languageEnglish
Title of host publicationPhysics of Semiconductors - 28th International Conference on the Physics of Semiconductors, ICPS 2006, Part A and B
Pages807-808
Number of pages2
DOIs
StatePublished - 2007
Event28th International Conference on the Physics of Semiconductors, ICPS 2006 - Vienna, Austria
Duration: 24 Jul 200628 Jul 2006

Publication series

NameAIP Conference Proceedings
Volume893
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference28th International Conference on the Physics of Semiconductors, ICPS 2006
Country/TerritoryAustria
CityVienna
Period24/07/0628/07/06

Keywords

  • IPGQDT
  • NDR
  • SET

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