Scattering studies of nanoporous organosilicate thin films imprinted with reactive star porogens

Nanoporous organosilicate, poly(methylsilsesquioxane), thin films imprinted with reactive star porogens were analyzed using TSAXS and GISAXS. It was found that the nanopores generated in the dielectric film by he sacrificial thermal degradation of the PCL4 porogens were spherical in shape. It was observed that the reactive triathlons modification of the end groups of four-armed porogens prevents severe aggregation of star-shaped porogens with multiple arms in the preparation of ultralow-k nanoporous dielectric films. The results show that GISAXS combined with TSAXS can quantitatively characterize the structures and properties of ultralow-k nanoporous dielectric thin films on substrates.