Abstract
Si single-electron transistors with sidewall depletion gates on a silicon-on-insulator nanowire are proposed and fabricated, using the combination of the conventional lithography and process technology. The size dependence of device characteristics shows good controllability and reproducibility, and a dynamic multi-functional SET logic is successfully demonstrated at 10 K, for the first time.
| Original language | English |
|---|---|
| Pages (from-to) | 151-154 |
| Number of pages | 4 |
| Journal | Technical Digest - International Electron Devices Meeting |
| DOIs | |
| State | Published - 2001 |