Single-electron tunneling in silicon-on-insulator nano-wire transistors

  • K. H. Cho
  • , S. H. Son
  • , S. H. Hong
  • , B. C. Kim
  • , S. W. Hwang
  • , D. Ahn
  • , B. G. Park
  • , B. Naser
  • , J. F. Lin
  • , J. P. Bird
  • , D. K. Ferry

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The gate bias dependent evolution of the Coulomb oscillations in a silicon-on-insulator nano-wire transistor is reported. Transport data obtained for a wide range of front- and back-gate bias strongly suggest that multiple quantum dots (QDs) with different potential depths are formed in the nano-wire channel. Our data can be clearly interpreted as arising from the turning on or off of one of these QDs as the back-gate bias is varied. Quantitative calculation based on the model of single-electron tunneling through two parallel QDs is in reasonable agreement with the measured data in the back-gate bias range where the third dot is not activated.

Original languageEnglish
Pages (from-to)245-251
Number of pages7
JournalSuperlattices and Microstructures
Volume34
Issue number3-6
DOIs
StatePublished - Sep 2003

Keywords

  • Nano-wire
  • Potential fluctuation
  • SOI
  • Single-electron tunneling

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