Site-defined micropatterning using Atomic Force Microscopic lithography

Inhee Choi, Younghun Kim, Changmook Kim, Jinsoo Kim, Kyunghee Choi, Jongheop Yi

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (V0). Terminal group (-CH 3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication.

Original languageEnglish
Pages (from-to)903-906
Number of pages4
JournalKey Engineering Materials
Issue numberI
StatePublished - 2005


  • AFM anodic oxidation
  • AFM lithography
  • Metal nanoparticle
  • Micropatterning
  • Self-assembled monolayer


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