Site-defined micropatterning using Atomic Force Microscopic lithography

Inhee Choi; Younghun Kim; Changmook Kim; Jinsoo Kim; Kyunghee Choi; Jongheop Yi

doi:10.4028/0-87849-958-x.903

Site-defined micropatterning using Atomic Force Microscopic lithography

Inhee Choi, Younghun Kim, Changmook Kim, Jinsoo Kim, Kyunghee Choi, Jongheop Yi

Department of Life Science

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (V₀). Terminal group (-CH ₃) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication.

Original language	English
Pages (from-to)	903-906
Number of pages	4
Journal	Key Engineering Materials
Volume	277-279
Issue number	I
DOIs	https://doi.org/10.4028/0-87849-958-x.903
State	Published - 2005

Keywords

AFM anodic oxidation
AFM lithography
Metal nanoparticle
Micropatterning
Self-assembled monolayer

Access to Document

10.4028/0-87849-958-x.903

Cite this

@article{988480bd0c504f0cb5bdafce6b3c0bf7,

title = "Site-defined micropatterning using Atomic Force Microscopic lithography",

abstract = "Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (V0). Terminal group (-CH 3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication.",

keywords = "AFM anodic oxidation, AFM lithography, Metal nanoparticle, Micropatterning, Self-assembled monolayer",

author = "Inhee Choi and Younghun Kim and Changmook Kim and Jinsoo Kim and Kyunghee Choi and Jongheop Yi",

year = "2005",

doi = "10.4028/0-87849-958-x.903",

language = "English",

volume = "277-279",

pages = "903--906",

journal = "Key Engineering Materials",

issn = "1013-9826",

publisher = "Trans Tech Publications Ltd.",

number = "I",

}

TY - JOUR

T1 - Site-defined micropatterning using Atomic Force Microscopic lithography

AU - Choi, Inhee

AU - Kim, Younghun

AU - Kim, Changmook

AU - Kim, Jinsoo

AU - Choi, Kyunghee

AU - Yi, Jongheop

PY - 2005

Y1 - 2005

N2 - Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (V0). Terminal group (-CH 3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication.

AB - Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (V0). Terminal group (-CH 3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication.

KW - AFM anodic oxidation

KW - AFM lithography

KW - Metal nanoparticle

KW - Micropatterning

KW - Self-assembled monolayer

UR - http://www.scopus.com/inward/record.url?scp=27144554051&partnerID=8YFLogxK

U2 - 10.4028/0-87849-958-x.903

DO - 10.4028/0-87849-958-x.903

M3 - Article

AN - SCOPUS:27144554051

SN - 1013-9826

VL - 277-279

SP - 903

EP - 906

JO - Key Engineering Materials

JF - Key Engineering Materials

IS - I

ER -

Site-defined micropatterning using Atomic Force Microscopic lithography

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this