Abstract
A novel stacked gated twin-bit SONOS memory for high-density nonvolatile flash memory is introduced. We introduced gated twin-bit (GTB) memory previously that has a cut-off gate and two memory nodes at a single wordline. To increase the density of the GTB memory integration, we stacked poly-silicon gates in a vertical direction. In a 4F$2$ size, we can integrate 2 N memory nodes, where N is the number of stacked gates. In this paper, its fabrication method is introduced and electrical characteristics are investigated thoroughly by device simulations.
Original language | English |
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Article number | 6081945 |
Pages (from-to) | 307-313 |
Number of pages | 7 |
Journal | IEEE Transactions on Nanotechnology |
Volume | 11 |
Issue number | 2 |
DOIs | |
State | Published - Mar 2012 |
Keywords
- 3-D NAND flash memory
- Cut-off gate
- SONOS
- stacked gated twin-bit (SGTB)
- vertical channel