TY - GEN
T1 - Structural characterization of nanoporous low-dielectric constant SiCOH films using organosilane precursors
AU - Heo, K.
AU - Park, S. G.
AU - Yoon, J.
AU - Jin, S.
AU - Rhee, S. W.
AU - Ree, M.
PY - 2007
Y1 - 2007
N2 - Synchrotron grazing incidence small-angle X-ray scattering and X-ray reflectivity analysis were performed to investigate the nanoporous structure of low dielectric constant carbon-doped silicon oxide films, which were deposited with plasma enhanced chemical vapor deposition from several silane precursors containing one to three vinyl groups with the aid of oxygen gas.
AB - Synchrotron grazing incidence small-angle X-ray scattering and X-ray reflectivity analysis were performed to investigate the nanoporous structure of low dielectric constant carbon-doped silicon oxide films, which were deposited with plasma enhanced chemical vapor deposition from several silane precursors containing one to three vinyl groups with the aid of oxygen gas.
KW - Grazing incidence small-angle X-ray scattering
KW - Low dielectric constant SiCOH film
KW - Organosilane precursor
KW - Plasma enhanced chemical vapor deposition
KW - Specular X-ray reflectivity
UR - http://www.scopus.com/inward/record.url?scp=34547966776&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:34547966776
SN - 1420063421
SN - 9781420063424
SN - 1420063766
SN - 9781420063769
T3 - 2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007, Technical Proceedings
SP - 122
EP - 123
BT - 2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007, Technical Proceedings
T2 - 2007 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2007
Y2 - 20 May 2007 through 24 May 2007
ER -