Synchrotron X-ray scattering and reflectivity studies of the structure of low dielectric constant SiOCH thin films prepared from bistrimethylsilylmethane by chemical vapor deposition

Kyuyoung Heo, Kyoung Suk Oh, Jinhwan Yoon, Kyeong Sik Jin, Sangwoo Jin, Chi Kyu Choi, Moonhor Ree

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