The characterization of bottom-gate thin film transistors adapted nanocrystalline silicon as active layer by catalytic CVD at low temperature

Youn Jin Lee, Kyoung Min Lee, Jae Dam Hwang, Kil Sun No, Kap Soo Yoon, Sung Hoon Yang, Sunghwan Won, Junghyun Sok, Kyoungwan Park, Wan Shick Hong

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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