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Tuning the interference color with pecvd prepared dlc thickness
Saebom Park
, Kwangbae Kim
, Hojun Kim
, Chihwan Kim
, Hyun Woo Choi
,
Ohsung Song
Department of Materials Science and Engineering
Turinroad Co. Ltd. 113-11
University of Seoul
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Engineering
Assuming
20%
Chemical Vapor Deposition
20%
Diamond-Like Carbon
40%
Low-Temperature
20%
Models
20%
Performance
20%
Roughness
40%
Scanning Electron Microscope
20%
Substrates
40%
Surface
40%
Thickness
100%
Thin Films
60%
Vapor Deposition
20%
Chemical Engineering
Carbon
100%
Diamond
100%
Plasma Enhanced Chemical Vapor Deposition
50%
Silicon
50%
Temperature
50%
Material Science
Coating
12%
Color
100%
Devices
12%
Plasma-Enhanced Chemical Vapor Deposition
12%
Scanning Electron Microscopy
12%
Silicon
12%
Single Crystal
12%
Surface
12%
Surface Roughness
25%
Temperature
12%
Thin Films
37%