TY - JOUR
T1 - Unveiling the Potential of HfO2/WS2 Bilayer Films
T2 - Robust Analog Switching and Synaptic Emulation for Advanced Memory and Neuromorphic Computing
AU - Ismail, Muhammad
AU - Rasheed, Maria
AU - Kim, Sunghun
AU - Mahata, Chandreswar
AU - Kang, Myounggon
AU - Kim, Sungjun
N1 - Publisher Copyright:
© 2023 American Chemical Society.
PY - 2023/11/6
Y1 - 2023/11/6
N2 - Nonvolatile memories using two-dimensional materials and high-k oxides have gained attention for their potential to achieve robust analog switching, easy memristive device integration, and low-energy consumption. In this study, we fabricated Pt/TiN/HfO2/WS2/Pt memristive devices. To implement these devices, a WS2 film was thermally evaporated under high vacuum conditions followed by HfO2 growth using atomic layer deposition at 400 °C. Detailed analysis using high-resolution transmission electron microscopy and X-ray photoelectron spectroscopy revealed diffusion of W and S atoms within the HfO2 layer and extraction of oxygen by W atoms, thus resulting in a multilayer structure (HfWOySx, Wx-1OySx, and W1-xOySx) with varying ratios of oxygen, tungsten, and sulfur atoms (x and y). The fabricated devices demonstrated consistent and stable analogue switching over numerous cycles, with exceptional endurance (2000 cycles) and retention (103 s). They exhibited high cycle-to-cycle consistency, as evidenced by the low-coefficient of variation (3.5% and 4.0% for the set and reset voltages, respectively). By modulating the reset stop voltage, we achieved five-level resistance states, thus making these devices capable of being used in artificial synapses. Furthermore, we observed analog switching with gradual resistance changes under different current compliance conditions by incrementally adjusting the reset-stop voltage. The memristor-based artificial synapses exhibited fundamental synaptic functions, such as long-term potentiation, long-term depression, paired-pulse facilitation, paired-pulse depression, and spike-timing-dependent plasticity for long-term and short-term plasticity. Moreover, we employed a three-layer artificial neural network for image recognition, achieving 94% accuracy using identical pulse amplitudes. These findings highlight the potential of HfO2/WS2 bilayer films, enable controllable analogue switching, and simulate synaptic functions. They hold promise for future data storage memory and neuromorphic computing systems.
AB - Nonvolatile memories using two-dimensional materials and high-k oxides have gained attention for their potential to achieve robust analog switching, easy memristive device integration, and low-energy consumption. In this study, we fabricated Pt/TiN/HfO2/WS2/Pt memristive devices. To implement these devices, a WS2 film was thermally evaporated under high vacuum conditions followed by HfO2 growth using atomic layer deposition at 400 °C. Detailed analysis using high-resolution transmission electron microscopy and X-ray photoelectron spectroscopy revealed diffusion of W and S atoms within the HfO2 layer and extraction of oxygen by W atoms, thus resulting in a multilayer structure (HfWOySx, Wx-1OySx, and W1-xOySx) with varying ratios of oxygen, tungsten, and sulfur atoms (x and y). The fabricated devices demonstrated consistent and stable analogue switching over numerous cycles, with exceptional endurance (2000 cycles) and retention (103 s). They exhibited high cycle-to-cycle consistency, as evidenced by the low-coefficient of variation (3.5% and 4.0% for the set and reset voltages, respectively). By modulating the reset stop voltage, we achieved five-level resistance states, thus making these devices capable of being used in artificial synapses. Furthermore, we observed analog switching with gradual resistance changes under different current compliance conditions by incrementally adjusting the reset-stop voltage. The memristor-based artificial synapses exhibited fundamental synaptic functions, such as long-term potentiation, long-term depression, paired-pulse facilitation, paired-pulse depression, and spike-timing-dependent plasticity for long-term and short-term plasticity. Moreover, we employed a three-layer artificial neural network for image recognition, achieving 94% accuracy using identical pulse amplitudes. These findings highlight the potential of HfO2/WS2 bilayer films, enable controllable analogue switching, and simulate synaptic functions. They hold promise for future data storage memory and neuromorphic computing systems.
UR - http://www.scopus.com/inward/record.url?scp=85177755586&partnerID=8YFLogxK
U2 - 10.1021/acsmaterialslett.3c00600
DO - 10.1021/acsmaterialslett.3c00600
M3 - Article
AN - SCOPUS:85177755586
SN - 2639-4979
VL - 5
SP - 3080
EP - 3092
JO - ACS Materials Letters
JF - ACS Materials Letters
IS - 11
ER -